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CMP partners with CMC and MOSIS to introduce a 3D-IC process

June 22, 2010 | Paul Buckley | 222902510
CMP partners with CMC and MOSIS to introduce a 3D-IC process A 3D-IC MPW service based on Tezzaron's SuperContact technology and GLOBALFOUNDRIES 130nm CMOS is to be offered by a partnership formed between Grenoble-based broker in ICs and MEMS for prototyping and low volume production, CMP, and CMC Microsystems, a non-profit organization that supports microelectronics and microsystems R&D in Canada, and California-based MOSIS that provides fabrication services to designers of advanced integrated circuits (ICs).
The first MPW run is being targeted for January 2011:
  • 2-tier face-to-face bonded wafers
  • 130nm CMOS process for both tiers
  • Top tier exposing TSV and backside metal pads for wire bonding.
A design-kit supporting 3D-IC design with standard-cells and IO libraries is available.
Further MPW runs schedule supporting process flavors (multiple tiers beyond 2, different CMOS flavors for different tiers) will be driven by user's requirements.

Related link:

cmp.imag.fr

www.mosis.com

www.cmc.ca








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