LONDON — Non-volatile memory supplier Numonyx BV (Geneva, Switzerland) has announced the availability of samples of multi-level cell (MLC) NOR flash memory products made using a 45-nm process technology. The company claimed its 45-nm producrs are the "most advanced" NOR flash memories in the market. However, while some commercial production is expected in 2009, high volume production is not scheduled until 2010.

NOR flash memory chips are used in mobile phones to run phone operations, manage personal data and store photos, music and videos.

The 45-nm 1-Gbit monolithic device is based on the StrataFlash memory architecture and is drop-in compatible with Numonyx 65-nm NOR flash chips. The 45-nm components increase the speed in which data is written by up to 50 percent over the previous generation, the company said.

"The mobile phone memory segment remains large and the need for high-density, low-cost, non-volatile NOR flash memory continues to drive aggressive scaling requirements," said Ed Doller, chief technology officer at Numonyx, in a statement. "Numonyx engineers overcame major scaling limitations by developing new process techniques, to produce the seventh generation MLC NOR flash on the industry's most advanced 45-nm technology, and to be the first to bring the cost and performance benefits to our customers."

The memory uses a novel self-aligned contact (SAC) approach that allows the memory to scale.

Numonyx is sampling in limited quantities and densities, and plans to introduce products on the 45-nm process some time during 2009. High volume production is not expected until 2010, the company said.

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